Three-dimensional (3D) display has attracted considerable attention in recent years because of development in display
technology. Various methods for realizing 3D display have been proposed; among them, multi-view display could be
practical to implement before aspiring 3D display. The term of multi-view display system based on autostereoscopic
display has the meaning of view splitting; the view images are projected to the pre-defined positions from the same
display device. Therefore the users located at the correct positions can see corresponding images. Although the multi-view
display technique has been studied by many research groups, the fundamental importance of the sound with display
has not, so far, been noticed nor has been examined in detail. The purpose of this paper is to realize a multi-view display
system with directional sound, which allows the individual observer to experience directional sound in multi-view
display environment. The explanation and experimental results of the proposed system are provided.
Recently, a pattern size gradually has reduced to enhance the integration of semiconductor device. As minimum linewidths have shrunk, the exposure wavelength has also progressively shrunk. The exposure wavelengths have been reduced progressively from 436 nm to 365 nm to 248 nm to 193 nm. Expose wavelength shrink caused some serious problems. One of the problems to be solved is growing defect in the reticle during the process. Reticle growing defect is called a haze. Haze is formed around the pellicle, on the quartz side of the mask and on the chrome side of the mask. In this investigation, mask haze is intentionally formed on the backside of mask by 193 nm laser irradiation. And the thickness is measured by the spectroscopic ellipsometry. This paper describes the relationship between transmittance and the haze formation, photochemical reactions and the haze effect on the process latitude. In addition, throughput is decreased due to haze formation.
Haze formation on reticle continues to be a significant problem for the semiconductor industry. Haze can be formed on the outside pellicle and on the quartz back side of the reticle. Major component of the haze is known to be aluminum sulfate that comes from the reticle cleaning process. The reticle materials, the exposure wavelength, roughness of photomask and this haze will affect the resolution and process latitude. So the haze on the mask surface becomes more important. We need to know the usable lifetime of the reticle in terms of haze and need to know how to increase the
lifetime by removing the haze, if possible. This paper introduces the haze measurement method by using the spectroscopic ellipsometry. The quantity of the haze including the roughness of the reticle can be accurately measured by the spectroscopic ellipsometry. The spectroscopic data shows the increase of the delta value with the energy dose given to the reticle. We confirm that this signal increase is directly the result of the haze increase with dose.