Young-Hwa Noh
at SAMSUG Electronics Co Ltd
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 9 September 2013 Paper
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Semiconductors, Manufacturing, Control systems, Telecommunications, Process control, Photomasks, Extreme ultraviolet, Mask making, Semiconducting wafers, Wafer manufacturing

Proceedings Article | 20 October 2006 Paper
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Semiconductors, Manufacturing, Computer simulations, Photomasks, Optical proximity correction, Mask making, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Tolerancing

Proceedings Article | 20 May 2006 Paper
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Semiconductors, Lithography, Electronics, Photomasks, Computed tomography, Double patterning technology, Critical dimension metrology, Data conversion, Data centers, Resolution enhancement technologies

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