Dr. Young-Je Yun
Principal Engineer
SPIE Involvement:
Author
Area of Expertise:
Photolithography , Flare and abberation , Optical-end-of-line process for CMOS imager
Publications (8)

Proceedings Article | 4 April 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Cadmium, Lenses, Glasses, Inspection, Head-mounted displays, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 24 March 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Wafer-level optics, Metrology, Inspection, Photomasks, Artificial intelligence, SRAF, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 21 March 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Diffraction, CMOS sensors, Finite-difference time-domain method, Cell phones, Microlens array, Copper indium disulfide, Image processing, Ray tracing, Diodes, Optical fiber cables

Proceedings Article | 7 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Statistical analysis, Etching, Metals, Oxygen, Photoresist materials, Head-mounted displays, Plasma treatment, Plasma, Tin

Proceedings Article | 7 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Optical lithography, Etching, Image processing, Image resolution, Photomasks, Critical dimension metrology, Line edge roughness, Edge roughness, Resolution enhancement technologies

Proceedings Article | 5 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Lithography, Etching, Image processing, Resistance, Image resolution, Image analysis, Photomasks, Critical dimension metrology, Failure analysis, Edge roughness

Showing 5 of 8 publications
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