Dr. Young Seog Kang
Master at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Conference Program Committee | Author
Publications (38)

PROCEEDINGS ARTICLE | April 11, 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Manufacturing

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Metrology, Sensors, Calibration, Scanners, Computer programming, Time metrology, Optical alignment, Semiconducting wafers, Wafer testing, Overlay metrology

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Metrology, Lithographic illumination, Data modeling, Calibration, Image processing, Scanners, Laser scanners, Process control, Finite element methods, Photomasks, Computational lithography, 3D scanning, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Reticles, Calibration, Scanners, Control systems, Distortion, Thermal effects, Optical alignment, Semiconducting wafers, HVAC controls, Overlay metrology, Temperature metrology

SPIE Journal Paper | March 29, 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Overlay metrology, Metrology, Distortion, Control systems, Semiconducting wafers, Scanners, Etching, Information technology, Image processing, Photomasks

PROCEEDINGS ARTICLE | March 22, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Lithography, Sensors, Scanners, Control systems, Process control, Servomechanisms, Optimization (mathematics), Semiconducting wafers, Yield improvement, Model-based design

Showing 5 of 38 publications
Conference Committee Involvement (5)
Optical Microlithography XXXI
27 February 2018 | San Jose, California, United States
Optical Microlithography XXX
28 February 2017 | San Jose, California, United States
Optical Microlithography XXIX
23 February 2016 | San Jose, California, United States
Optical Microlithography XXVIII
24 February 2015 | San Jose, California, United States
Optical Microlithography XXVII
25 February 2014 | San Jose, California, United States
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