Dr. Young Seog Kang
Master at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Conference Program Committee | Author
Area of Expertise:
EUV , Lithography , Overlay
Publications (38)

Proceedings Article | 11 April 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Manufacturing

Proceedings Article | 24 March 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Metrology, Sensors, Calibration, Scanners, Computer programming, Time metrology, Optical alignment, Semiconducting wafers, Wafer testing, Overlay metrology

Proceedings Article | 24 March 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Metrology, Lithographic illumination, Data modeling, Calibration, Image processing, Scanners, Laser scanners, Process control, Finite element methods, Photomasks, Computational lithography, 3D scanning, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 24 March 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Reticles, Calibration, Scanners, Control systems, Distortion, Thermal effects, Optical alignment, Semiconducting wafers, HVAC controls, Overlay metrology, Temperature metrology

SPIE Journal Paper | 29 March 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Overlay metrology, Metrology, Distortion, Control systems, Semiconducting wafers, Scanners, Etching, Information technology, Image processing, Photomasks

Showing 5 of 38 publications
Conference Committee Involvement (7)
Optical Microlithography XXXIII
25 February 2020 | San Jose, California, United States
Optical Microlithography XXXII
26 February 2019 | San Jose, California, United States
Optical Microlithography XXXI
27 February 2018 | San Jose, California, United States
Optical Microlithography XXX
28 February 2017 | San Jose, California, United States
Optical Microlithography XXIX
23 February 2016 | San Jose, California, United States
Showing 5 of 7 Conference Committees
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