Dr. Young-Sik Kim
at SK Hynix Inc
SPIE Involvement:
Author
Publications (21)

Proceedings Article | 20 March 2020 Paper
Cees Lambregts, Ik-Hyun Jeong, Seung-Woo Koo, Hyun-Sok Kim, Jung-Il Hwang, Jae-Wuk Ju, Young-Sik Kim, Rizvi Rahman, Marc Hauptmann, Raheleh Pishkari, Kwang-Young Hu, Paul Böcker, Kang-Min Lee, Allwyn Boustheen, Dong-Hak Lee, Dong-Jin Lee, Kang-San Lee, Min-Shik Kim, In-Ho Joo
Proceedings Volume 11325, 113252X (2020) https://doi.org/10.1117/12.2552028
KEYWORDS: Overlay metrology, Etching, Inspection, Semiconducting wafers, Metrology, Feedback loops, Scanners, Spatial frequencies, High volume manufacturing

Proceedings Article | 20 March 2019 Presentation + Paper
Katja Viatkina, Marcus Musselman, Marcus Carbery, Ssuwei Chen, Lucian Schmidt, Heidi Kwon, Jae Gyoo Lee, Ik-Hyun Jeong , Seung-Woo Koo, Hyun-Sok Kim, Jae-Wuk Ju, Young-Sik Kim, Yong-Tae Cho, Heung-Joo Kim, Tom van Hemert, Ruud de Wit, David Deckers, Owen Chen, Nang-Lyeom Oh
Proceedings Volume 10963, 1096308 (2019) https://doi.org/10.1117/12.2516578
KEYWORDS: Etching, Overlay metrology, Scanners, Semiconducting wafers, Metrology, Critical dimension metrology, Lithography, Plasma, Process control, Optical lithography

Proceedings Article | 20 March 2019 Presentation + Paper
Yeong-Oh Kong, Hyun-Sok Kim, Ji-Hyun Song, Jae-Wuk Ju, Young-Sik Kim, Cees Lambregts, Miao Yu, Rizvi Rahman, Leendertjan Karssemeijer, Elliott McNamara, Jong-Cheol Choi, Nang-Lyeom Oh, Jin-Seo Lee, Paul Böcker, Ik-Hyun Jeong, Kang-San Lee
Proceedings Volume 10961, 109610A (2019) https://doi.org/10.1117/12.2516259
KEYWORDS: Optical alignment, Semiconducting wafers, Calibration, Data modeling, Overlay metrology, Metrology, Scanners, High volume manufacturing, Lithography, Sensors

Proceedings Article | 13 March 2018 Presentation + Paper
Aileen Soco, Paul Hinnen, Elliott McNamara, Giacomo Miceli, Paul Böcker, Young-Sik Kim, Dong-Kiu Park, Hyun-Sok Kim, Moo-Young Seo, Jae-Wuk Ju, Mir Shahrjerdy, Arno van Leest, Nang-Lyeom Oh, Sang-Hoon Jung, Yvon Chai, Jun-Hyung Lee, Jennifer Massier
Proceedings Volume 10585, 105850V (2018) https://doi.org/10.1117/12.2297094
KEYWORDS: Overlay metrology, Metrology, Semiconducting wafers, Control systems, Manufacturing, Etching, Lithography, Critical dimension metrology, Inspection

Proceedings Article | 13 March 2018 Paper
Honggoo Lee, Sharon Aharon , Guy Ben-Dov , Anna Golotsvan, Dana Klein, Tal Marciano, Saltoun Lilach, Yoonshik Kang, Kyuchan Shim, Minhyung Hong, Sangjoon Han, Seungyoung Kim, Jieun Lee, Dongyoung Lee, Eungryong Oh, Ahlin Choi, Youngsik Kim, Eitan Hajaj, Dan Serero
Proceedings Volume 10585, 1058532 (2018) https://doi.org/10.1117/12.2300153
KEYWORDS: Overlay metrology, Semiconducting wafers, Diffraction, Light sources, Imaging technologies, Integrated circuits, Visible radiation, Optical testing, Electromagnetism, Signal processing

Showing 5 of 21 publications
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