Young Woong Kim
at Hanyang Univ
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 22 February 2021 Poster + Presentation
Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII
KEYWORDS: Semiconductors, Microscopes, Phase retrieval, Image quality, Photomasks, Extreme ultraviolet, Semiconductor manufacturing, Reconstruction algorithms, Phase measurement, Phase shifts

Proceedings Article | 16 October 2019 Presentation
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Lithography, Microscopes, Light sources, Defect detection, Deep ultraviolet, Inspection, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

SPIE Journal Paper | 28 September 2019
JM3 Vol. 18 Issue 03
KEYWORDS: Extreme ultraviolet, Pellicles, Photomasks, Particles, Semiconducting wafers, Transmittance, Contamination, Inspection, Extreme ultraviolet lithography, Diffraction

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