Dr. Young C. Bae
Sales Director at Rohm and Haas Electronic Materials, LLC
SPIE Involvement:
Publications (14)

Proceedings Article | 16 April 2011 Paper
Proceedings Volume 7972, 797206 (2011) https://doi.org/10.1117/12.882843
KEYWORDS: Photoresist developing, Photoresist materials, Polymers, Systems modeling, Semiconducting wafers, Optical lithography, Optical proximity correction, Photomasks, Etching, Nanoimprint lithography

Proceedings Article | 16 April 2011 Paper
Proceedings Volume 7972, 79720Y (2011) https://doi.org/10.1117/12.879506
KEYWORDS: Image processing, Systems modeling, Data modeling, Photoresist processing, Neodymium, Image quality, Photoresist developing, Photoresist materials, Lithography, Polymers

Proceedings Article | 16 April 2011 Paper
Young Bae, Seung-Hyun Lee, Rosemary Bell, Lori Joesten, George Barclay
Proceedings Volume 7972, 797207 (2011) https://doi.org/10.1117/12.882141
KEYWORDS: Nanoimprint lithography, Image processing, Photoresist processing, Imaging systems, Lithography, Semiconducting wafers, Photomasks, Photoresist developing, Image resolution, Critical dimension metrology

Proceedings Article | 31 March 2010 Paper
Lori Joesten, Ken Spizuoco, Yi Liu, Young Bae
Proceedings Volume 7639, 76391X (2010) https://doi.org/10.1117/12.846602
KEYWORDS: Photoresist processing, Standards development, Solids, Double patterning technology, Image processing, Semiconducting wafers, Industrial chemicals, Chemical reactions, Thermal effects, Coating

Proceedings Article | 26 March 2010 Paper
Proceedings Volume 7639, 76392W (2010) https://doi.org/10.1117/12.846748
KEYWORDS: Double patterning technology, Lithography, Photoresist processing, Semiconducting wafers, Electroluminescence, Astatine, Semiconductors, Image processing, Etching, Polymers

Showing 5 of 14 publications
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