Dr. Young C. Bae
Sales Director at Rohm and Haas Electronic Materials, LLC
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 16 April 2011 Paper
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Data modeling, Polymers, Image processing, Photoresist materials, Image quality, Neodymium, Photoresist processing, Systems modeling, Photoresist developing

Proceedings Article | 16 April 2011 Paper
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Optical lithography, Etching, Polymers, Photoresist materials, Photomasks, Optical proximity correction, Nanoimprint lithography, Semiconducting wafers, Systems modeling, Photoresist developing

Proceedings Article | 16 April 2011 Paper
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Imaging systems, Image processing, Image resolution, Photomasks, Nanoimprint lithography, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Photoresist developing

Proceedings Article | 31 March 2010 Paper
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Image processing, Coating, Solids, Thermal effects, Double patterning technology, Chemical reactions, Photoresist processing, Semiconducting wafers, Standards development, Industrial chemicals

Proceedings Article | 26 March 2010 Paper
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Optical lithography, Image processing, Coating, Image resolution, Extreme ultraviolet lithography, Double patterning technology, Immersion lithography, Photoresist processing, Semiconducting wafers

Showing 5 of 14 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top