Youngmi Kim
at Dongbu HiTek Co Ltd
SPIE Involvement:
Publications (5)

Proceedings Article | 23 March 2011 Paper
Youngmi Kim, Jae-Young Choi, Kwangseon Choi, Jung-Hoe Choi, Sooryong Lee
Proceedings Volume 7973, 79732T (2011)
KEYWORDS: Etching, Metals, Optical proximity correction, Error analysis, Resolution enhancement technologies, Bridges, Photomasks, Model-based design, Head, Logic devices

Proceedings Article | 16 March 2009 Paper
Proceedings Volume 7274, 72742I (2009)
KEYWORDS: Optical proximity correction, Photomasks, Resolution enhancement technologies, Semiconducting wafers, Optical lithography, Lithography, Image processing, Manufacturing, Silicon, Microelectronics

Proceedings Article | 16 March 2009 Paper
Proceedings Volume 7274, 727423 (2009)
KEYWORDS: Calibration, Data modeling, Process modeling, Optical proximity correction, Lithography, Semiconducting wafers, Scanning electron microscopy, Photomasks, Image processing, Critical dimension metrology

Proceedings Article | 7 March 2008 Paper
Proceedings Volume 6924, 69243J (2008)
KEYWORDS: Data modeling, Reticles, Optical proximity correction, Critical dimension metrology, Calibration, Cadmium, Databases, Statistical modeling, Semiconducting wafers, Photomasks

Proceedings Article | 1 November 2007 Paper
Proceedings Volume 6730, 67303W (2007)
KEYWORDS: Optical proximity correction, Semiconducting wafers, Lithography, Metals, Photomasks, Databases, Reticles, Optical lithography, Logic, Bridges

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