Mr. Youngtag Woo Profile

Youngtag Woo

at ASML

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Publications (2)

Proceedings Article | 16 March 2016 Paper

Optimization of self-aligned double patterning (SADP)-compliant layout designs using pattern matching for 10nm technology nodes and beyond

Lynn Wang, Uwe Paul Schroeder, Youngtag Woo, Jia Zeng, Sriram Madhavan, Luigi Capodieci

Proceedings Volume 9781, 97810B (2016) https://doi.org/10.1117/12.2219358

KEYWORDS: Photomasks, Manufacturing, Lithography, Double patterning technology, Metals, Image classification, Library classification systems, Design for manufacturing, Design for manufacturability, Overlay metrology, Optical proximity correction, 193nm lithography

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Proceedings Article | 18 March 2015 Paper

Study of cut mask lithography options for sub-20nm metal routing

Yan Wang, Ryoung-Han Kim, Lei Yuan, Anindarupa Chunder, Chenchen Wang, Jia Zeng, Youngtag Woo, Jongwook Kye

Proceedings Volume 9426, 94260J (2015) https://doi.org/10.1117/12.2085716

KEYWORDS: Photomasks, Metals, Extreme ultraviolet, Optical lithography, EUV optics, Electron beam lithography, Lithography, Logic, Double patterning technology, Optical proximity correction

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