Dr. Youping Zhang
Director/Product Marketing at ASML US Inc
SPIE Involvement:
Author
Publications (15)

Proceedings Article | 20 March 2019
Proc. SPIE. 10961, Optical Microlithography XXXII
KEYWORDS: Metrology, Optical lithography, Printing, Signal processing, Optical proximity correction, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 28 March 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Semiconductors, Reticles, Metrology, Optical lithography, Sensors, Etching, Scanners, Critical dimension metrology, Semiconducting wafers, Overlay metrology

Proceedings Article | 20 October 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX

Proceedings Article | 24 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Target detection, Diffraction, Metrology, Optical lithography, Error analysis, Electron microscopes, Scanning electron microscopy, Optical proximity correction, Critical dimension metrology, Overlay metrology

Proceedings Article | 19 March 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Target detection, Metrology, Etching, Scanners, Time metrology, Process control, Target acquisition, Semiconducting wafers, Overlay metrology, Back end of line

Proceedings Article | 19 March 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Target detection, Lithography, Reticles, Metrology, Optical lithography, Etching, Optical proximity correction, Semiconducting wafers, Overlay metrology, Resolution enhancement technologies

Showing 5 of 15 publications
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