Mr. Youval Nehmadi
Business Development Manager at Applied Materials Inc
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | March 14, 2006
Proc. SPIE. 6156, Design and Process Integration for Microelectronic Manufacturing IV
KEYWORDS: Lithography, Manufacturing, Control systems, Electroluminescence, Scanning electron microscopy, Process control, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Reticles, Metrology, Data modeling, Calibration, Scanning electron microscopy, Photomasks, Optical proximity correction, Computer aided design, Semiconducting wafers, Resolution enhancement technologies

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