Dr. Yow-Gwo Wang
Doctor at Univ of California Berkeley
SPIE Involvement:
Author
Publications (17)

SPIE Journal Paper | May 16, 2017
JM3 Vol. 16 Issue 02
KEYWORDS: Signal to noise ratio, Extreme ultraviolet, Inspection, Defect detection, Interference (communication)

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Signal to noise ratio, Optical design, Defect detection, Speckle, Optical inspection, Inspection equipment, Optical resolution, Photomasks, Extreme ultraviolet lithography, Synchrotrons, EUV optics, Plasma, Defect inspection

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Diffraction, Lithographic illumination, Imaging systems, Image processing, 3D modeling, Zernike polynomials, Photomasks, Extreme ultraviolet lithography, SRAF, Critical dimension metrology, 3D image processing

SPIE Journal Paper | March 16, 2017
JM3 Vol. 16 Issue 01
KEYWORDS: Signal to noise ratio, Interference (communication), Inspection, Speckle, Extreme ultraviolet, Optical design, Cameras, Defect detection, Speckle pattern, Photomasks

PROCEEDINGS ARTICLE | October 3, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Signal to noise ratio, Optical design, Speckle, Cameras, Inspection, Interference (communication), 3D modeling, Speckle pattern, Photomasks, Extreme ultraviolet

SPIE Journal Paper | July 12, 2016
JM3 Vol. 15 Issue 03
KEYWORDS: Photomasks, Extreme ultraviolet, Microscopes, Extreme ultraviolet lithography, Semiconducting wafers, Scanners, Modulation, Multilayers, Fiber optic illuminators, Nickel

Showing 5 of 17 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top