Yu-Cheng Chang
at Powerchip Technology Corp
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 27 March 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Semiconductors, Lithography, Radon, Etching, Computer simulations, Photoresist materials, Photomasks, Double patterning technology, Source mask optimization, Optical proximity correction, Semiconducting wafers, Resolution enhancement technologies

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