Dr. Yu-Jen Fan
SPIE Involvement:
Publications (17)

Proceedings Article | 4 April 2016 Paper
Proceedings Volume 9776, 97760W (2016) https://doi.org/10.1117/12.2222065
KEYWORDS: Extreme ultraviolet, Photoresist materials, Extreme ultraviolet lithography, Etching, Neodymium, Optical lithography, Photoresist developing, Lithography, Semiconducting wafers, Scanners

Proceedings Article | 20 March 2015 Paper
Proceedings Volume 9425, 942526 (2015) https://doi.org/10.1117/12.2086982
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Etching, Photoresist processing, Line width roughness, Photoresist materials, Lithography, Optical lithography, Critical dimension metrology, Double patterning technology

Proceedings Article | 16 March 2015 Paper
Proceedings Volume 9422, 94220L (2015) https://doi.org/10.1117/12.2086307
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Absorbance, Chemically amplified resists, Line width roughness, Electrons, Photons, Molecules, Photoresist materials, Metals

Proceedings Article | 16 March 2015 Paper
Proceedings Volume 9422, 942211 (2015) https://doi.org/10.1117/12.2087424
KEYWORDS: Extreme ultraviolet, Contamination, Extreme ultraviolet lithography, Chemically amplified resists, Line edge roughness, Semiconducting wafers, Line width roughness, Reflectivity, Hydrogen, Critical dimension metrology

Proceedings Article | 13 March 2015 Paper
Soichi Inoue, Eishi Shiobara, Takeshi Sasami, Isamu Takagi, Yukiko Kikuchi, Toru Fujimori, Shinya Minegishi, Robert Berg, Thomas Lucatorto, Shannon Hill, Charles Tarrio, Ivan Pollentier, Yen-Chih Lin, Yu-Jen Fan, Dominic Ashworth
Proceedings Volume 9422, 942212 (2015) https://doi.org/10.1117/12.2085700
KEYWORDS: Semiconducting wafers, Contamination, Picosecond phenomena, Temperature metrology, Extreme ultraviolet, Molecules, Extreme ultraviolet lithography, Electron beams, Standards development, Lithography

Showing 5 of 17 publications
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