Dr. Yu Yao Chang
Senior Engineer at Nanya Technology Corp
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 20 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Data modeling, Visualization, Scattering, Error analysis, Manufacturing, Printing, Photomasks, Optical proximity correction, SRAF, Model-based design

Proceedings Article | 28 June 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Wafer-level optics, Lithography, Scanners, Error analysis, Manufacturing, Image quality, Process control, Photomasks, Critical dimension metrology, Semiconducting wafers

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