Yu Ben
at GLOBALFOUNDRIES Inc.
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | June 30, 2012
Proc. SPIE. 8441, Photomask and Next-Generation Lithography Mask Technology XIX
KEYWORDS: Data modeling, Calibration, Electroluminescence, Source mask optimization, Optical proximity correction, Critical dimension metrology, Molybdenum, Semiconducting wafers, Tolerancing, Resolution enhancement technologies

PROCEEDINGS ARTICLE | April 4, 2011
Proc. SPIE. 7974, Design for Manufacturability through Design-Process Integration V
KEYWORDS: Principal component analysis, Statistical analysis, Visualization, Matrices, Computer simulations, Monte Carlo methods, Solids, Transistors, Failure analysis, Probability theory

PROCEEDINGS ARTICLE | March 4, 2008
Proc. SPIE. 6925, Design for Manufacturability through Design-Process Integration II
KEYWORDS: Lithography, Optical design, Metrology, Spatial frequencies, Composites, Pellicles, Scatterometry, Optical simulations, Binary data, Phase shifts

PROCEEDINGS ARTICLE | November 1, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Metrology, Data modeling, Calibration, Scatterometry, Finite element methods, Critical dimension metrology, Panoramic photography, Semiconducting wafers, Scatter measurement, Phase shifts

PROCEEDINGS ARTICLE | January 31, 2005
Proc. SPIE. 5624, Semiconductor and Organic Optoelectronic Materials and Devices
KEYWORDS: Reflectors, Light sources, Finite-difference time-domain method, Dielectrics, Gallium arsenide, Single photon, Photonic crystals, Quantum dots, Excitons, Quantum information

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