Dr. Yu Cao
Software Engineer at ASML San Jose
SPIE Involvement:
Author
Publications (19)

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Image processing, Photomasks, Machine learning, Source mask optimization, Computational lithography, Optical proximity correction, SRAF, Model-based design

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Lithography, Data modeling, Image processing, Photomasks, Machine learning, Computational lithography, Optical proximity correction, SRAF, Model-based design

PROCEEDINGS ARTICLE | April 5, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Reticles, Logic, Optical lithography, Etching, Scanners, Photomasks, Optical proximity correction, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | April 2, 2011
Proc. SPIE. 7985, 27th European Mask and Lithography Conference
KEYWORDS: Metrology, Data modeling, Calibration, Scanners, Printing, Photomasks, Critical dimension metrology, Optimization (mathematics), Semiconducting wafers, Model-based design

PROCEEDINGS ARTICLE | March 23, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Metrology, Diffractive optical elements, Cadmium, Data modeling, Birefringence, Scanners, Computational lithography, Critical dimension metrology, Semiconducting wafers, Fiber optic illuminators

PROCEEDINGS ARTICLE | March 4, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Optical lithography, Scanners, Computer simulations, Transform theory, Process control, Software development, Photomasks, Critical dimension metrology, Optimization (mathematics)

Showing 5 of 19 publications
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