Dr. Yu Chen
Senior CAE at Synopsys (Shanghai) Co., Ltd.
SPIE Involvement:
Senior status | Author
Area of Expertise:
semiconductor physics , lithographic simulation , OPC modeling , DFM , DTCO
Websites:
Profile Summary

With my class of fundamental sciences (2000-2004), I have majored in math and physics at Tsinghua University in Beijing and prepared myself with a B.Sc. for further pursuit of the applied sciences.
With the group of Prof Bang-Fen Zhu in Tsinghua University (2004-2010), I have carried out my theoretical study on the physics of semiconductor quantum wells, quantum wires and quantum dots with the Huang-Zhu model and strain effects in the heterostructures.
With the group of Dr Gerald Bastard in ENS-Paris (2007-2010), I finished my thesis on electron-phonon interactions in the Quantum Cascade Lasers in a strong magnetic field and the alloy delta scattering in the III-V compounds. My PhD is granted by Tsinghua University after my thesis defense in Beijing in 2010.
With Wuxi Nanotech Inc. (2010-2013), I have worked on physical modeling algorithm for optical lithography with GPU based parallelization architect, after I joined in the semiconductor industry.
Now I am serving the society/industry as a CAE with OPC/lithography modeling at Synopsys Shanghai branch (2013-present). I wish I could get more involved in the crossover of semiconductor device designing and manufacturing, taking the challenges of the century, and meeting the emerging demands from design for manufacturability, power efficiency, smart computation, deep learning and etc.
Publications (2)

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Lithography, Data modeling, Calibration, Computer simulations, Design for manufacturing, Photomasks, Silicon photonics, Semiconducting wafers, Device simulation, Instrument modeling

PROCEEDINGS ARTICLE | March 13, 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Coherence imaging, Polarization, Matrices, Error analysis, Computer simulations, Photomasks, Cadmium sulfide, Optical proximity correction, Convolution, System on a chip

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