Yu Zhang
at Shanghai Huali Microelectronics Corp
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11328, Design-Process-Technology Co-optimization for Manufacturability XIV
KEYWORDS: Semiconductors, Lithography, Monochromatic aberrations, Optical lithography, Image processing, Image resolution, Scanning electron microscopy, Computational lithography, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11328, Design-Process-Technology Co-optimization for Manufacturability XIV
KEYWORDS: Optical lithography, Image processing, Manufacturing, Adaptive optics, Neptune, Design for manufacturing, Extreme ultraviolet lithography, Source mask optimization, Critical dimension metrology, Design for manufacturability

Proceedings Article | 20 March 2020 Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Deep ultraviolet, Fin field effect transistors, Electro optical systems calibration, Calibration, Etching, Electron microscopes, Scanning electron microscopy, Transmission electron microscopy, Image quality, Precision measurement, Image filtering, Integrated circuits, Semiconducting wafers, 193nm lithography, Accuracy assessment

Proceedings Article | 20 March 2019 Paper
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Optical lithography, Defect detection, Etching, Image processing, Scanning electron microscopy, Process control, Wafer inspection, Semiconducting wafers, Process engineering, Chemical mechanical planarization

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