Mr. Yuan-Hsun Wu
Global Product Manager at Merck
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Electron beam lithography, Data modeling, Etching, Quartz, Coating, Manufacturing, Chromium, Photomasks, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Wafer-level optics, Lithography, Scanners, Error analysis, Manufacturing, Image quality, Process control, Photomasks, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | January 27, 2005
Proc. SPIE. 5645, Advanced Microlithography Technologies
KEYWORDS: Contamination, Etching, Quartz, Image processing, Coating, Chromium, Scanning electron microscopy, Photomasks, Optical alignment, Neodymium

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