Dr. Yuan He
at Siemens EDA
SPIE Involvement:
Publications (9)

SPIE Journal Paper | 11 September 2015
JM3, Vol. 14, Issue 03, 031216, (September 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.3.031216
KEYWORDS: Dysprosium, Photomasks, Immersion lithography, Source mask optimization, Optical proximity correction, Printing, Optical lithography, Visualization, Lens design, Directed self assembly

Proceedings Article | 19 March 2015 Paper
Proceedings Volume 9423, 942306 (2015) https://doi.org/10.1117/12.2085850
KEYWORDS: Photomasks, Optical proximity correction, Printing, Source mask optimization, Optical lithography, Neodymium, Visualization, Transmission electron microscopy, Dysprosium, Directed self assembly

Proceedings Article | 18 March 2015 Paper
Neal Lafferty, Yuan He, Jinhua Pei, Feng Shao, QingWei Liu, Xuelong Shi
Proceedings Volume 9426, 94260L (2015) https://doi.org/10.1117/12.2087176
KEYWORDS: Source mask optimization, Resolution enhancement technologies, Photomasks, Lithography, Optical proximity correction, Nanoimprint lithography, SRAF, Optical lithography, Photovoltaics, Visualization

Proceedings Article | 29 October 2014 Paper
Proceedings Volume 9235, 92351Z (2014) https://doi.org/10.1117/12.2069473
KEYWORDS: Resolution enhancement technologies, Source mask optimization, Photomasks, Optical lithography, Lithography, Optical proximity correction, Photovoltaics, Nanoimprint lithography, Visualization, Performance modeling

Proceedings Article | 12 April 2013 Paper
Yuan He, Alexander Serebryakov, Scott Light, Vivek Jain, Erik Byers, Ronald Goossens, Zhi-Yuan Niu, Peter Engblom, Scott Larson, Bernd Geh, Craig Hickman, Hoyoung Kang
Proceedings Volume 8683, 86830W (2013) https://doi.org/10.1117/12.2014402
KEYWORDS: Scanners, Semiconducting wafers, Critical dimension metrology, Wafer-level optics, Optical lithography, Metrology, Cadmium, Optics manufacturing, Databases, Diffractive optical elements

Showing 5 of 9 publications
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