Dr. Yuan He
at Mentor Graphics Corp
SPIE Involvement:
Author
Publications (9)

SPIE Journal Paper | September 11, 2015
JM3 Vol. 14 Issue 03
KEYWORDS: Dysprosium, Photomasks, Immersion lithography, Source mask optimization, Optical proximity correction, Printing, Optical lithography, Visualization, Lens design, Directed self assembly

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Optical lithography, Visualization, Transmission electron microscopy, Printing, Photomasks, Dysprosium, Directed self assembly, Source mask optimization, Optical proximity correction, Neodymium

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Lithography, Photovoltaics, Optical lithography, Visualization, Photomasks, Source mask optimization, Optical proximity correction, SRAF, Nanoimprint lithography, Resolution enhancement technologies

PROCEEDINGS ARTICLE | October 29, 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Lithography, Photovoltaics, Optical lithography, Visualization, Photomasks, Source mask optimization, Optical proximity correction, Nanoimprint lithography, Performance modeling, Resolution enhancement technologies

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Wafer-level optics, Metrology, Optical lithography, Diffractive optical elements, Cadmium, Databases, Scanners, Critical dimension metrology, Semiconducting wafers, Optics manufacturing

PROCEEDINGS ARTICLE | April 20, 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Thin films, Diffraction, Reflection, Sensors, Scanners, Manufacturing, Spatial light modulators, Optical alignment, Semiconducting wafers, Signal detection

Showing 5 of 9 publications
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