Yuan Hsu
at Photronics DNP Mask Corp
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 27 June 2019
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Contamination, Chromium, Etching, Chlorine, Plasma, Particles, Inspection, Photomasks, Dry etching, Scanning electron microscopy

Proceedings Article | 12 June 2018
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Coating, Plasma, Plasma treatment, Chlorine, Sputter deposition, Particles, Fluorine, Ceramics, Carbon, X-rays

Proceedings Article | 13 July 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Etching, Dry etching, Particles, Photomasks, Inspection, Defect inspection, Chromium, Photoresist developing, Reactive ion etching, Defect detection

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