Yuan Zhang
Director at SUSS MicroTec Inc
SPIE Involvement:
Publications (12)

Proceedings Article | 8 November 2005 Paper
Proceedings Volume 5992, 599229 (2005) https://doi.org/10.1117/12.637610
KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Reticles, Design for manufacturing, Lithography, Binary data, Manufacturing, Yield improvement, Semiconductors

Proceedings Article | 5 November 2005 Paper
Jennifer Qin, Yuan Zhang, Rob Delgado, Barry Rockwell, Florence Tan, Khoi Phan, Lothar Berger, Min Liu, Uwe Dietez
Proceedings Volume 5992, 59921E (2005) https://doi.org/10.1117/12.633170
KEYWORDS: Reticles, Photomasks, Air contamination, Semiconducting wafers, Pellicles, Ultraviolet radiation, Ions, Scanners, Inspection, Chromatography

Proceedings Article | 28 June 2005 Paper
Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617146
KEYWORDS: Molybdenum, Source mask optimization, Computed tomography, Photomasks, Resolution enhancement technologies, Design for manufacturing, Optical proximity correction, Error analysis, Statistical analysis, Lithography

Proceedings Article | 12 May 2005 Paper
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.593219
KEYWORDS: Manufacturing, Photomasks, Electroluminescence, Etching, Critical dimension metrology, Lithography, Standards development, Phase shifts, Scanning electron microscopy, Optics manufacturing

Proceedings Article | 12 May 2005 Paper
Y. Kim, H. Kang, Yuan Zhang, Chuong Tran, Nigel Farrar, Jennifer Qin, Barry Rockwell, H. Cho, Rand Cottle, David Chan, Pat Martin, S. Choi, Chris Progler
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.598913
KEYWORDS: Photomasks, Air contamination, Pellicles, Laser irradiation, Ions, Pulsed laser operation, Chromium, Chromatography, Inspection, Laser scanners

Showing 5 of 12 publications
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