Yuan Zhang
Director at SUSS MicroTec Inc
SPIE Involvement:
Author
Publications (12)

Proceedings Article | 8 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Semiconductors, Lithography, Reticles, Manufacturing, Design for manufacturing, Photomasks, Optical proximity correction, Semiconducting wafers, Yield improvement, Binary data

Proceedings Article | 5 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Air contamination, Scanners, Ultraviolet radiation, Ions, Inspection, Pellicles, Photomasks, Semiconducting wafers, Chromatography

Proceedings Article | 28 June 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Lithography, Statistical analysis, Error analysis, Design for manufacturing, Photomasks, Computed tomography, Source mask optimization, Optical proximity correction, Molybdenum, Resolution enhancement technologies

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Air contamination, Ions, Inspection, Chromium, Laser irradiation, Pellicles, Laser scanners, Photomasks, Pulsed laser operation, Chromatography

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, Etching, Manufacturing, Electroluminescence, Scanning electron microscopy, Photomasks, Critical dimension metrology, Optics manufacturing, Standards development, Phase shifts

Proceedings Article | 5 May 2005
Proc. SPIE. 5756, Design and Process Integration for Microelectronic Manufacturing III
KEYWORDS: Lithography, Electron beam lithography, Manufacturing, Design for manufacturing, Photomasks, Optical proximity correction, Mask making, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies

Showing 5 of 12 publications
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