Dr. Yuansheng Ma
Engineer
SPIE Involvement:
Author
Publications (17)

Proceedings Article | 23 March 2020
Proc. SPIE. 11329, Advanced Etch Technology for Nanopatterning IX
KEYWORDS: Data modeling, Etching, Inspection, Neural networks, Photomasks, Machine learning, Optical proximity correction, Semiconducting wafers, Process modeling

Proceedings Article | 20 March 2019
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Wafer-level optics, Defect detection, Data modeling, Feature extraction, Machine learning, Optical proximity correction, High volume manufacturing, Semiconducting wafers, Optics manufacturing, Statistical modeling

Proceedings Article | 28 March 2018
Proc. SPIE. 10588, Design-Process-Technology Co-optimization for Manufacturability XII
KEYWORDS: Data modeling, Calibration, Inspection, Finite element methods, Bridges, Photomasks, Optical proximity correction, Semiconducting wafers, Failure analysis, Optics manufacturing

SPIE Journal Paper | 23 March 2018
JM3 Vol. 17 Issue 01
KEYWORDS: Directed self assembly, Connectors, Global Positioning System, Curium, Model-based design, Detection and tracking algorithms, Calibration, Monte Carlo methods, Data modeling, Failure analysis

Proceedings Article | 20 March 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Optical lithography, Optical proximity correction, SRAF

Showing 5 of 17 publications
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