Yuanting Cui
Process Engineer at Qimonda Richmond LLC
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 17 May 2005
Proc. SPIE. 5755, Data Analysis and Modeling for Process Control II
KEYWORDS: Semiconducting wafers, Lithography, Manufacturing, Process control, Process modeling, Control systems, Tolerancing, Data modeling, Critical dimension metrology, Metrology

Proceedings Article | 24 May 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Optical alignment, Signal processing, Semiconducting wafers, Scanning probe microscopy, Etching, Photoresist processing, Oxides, Chemical mechanical planarization, Reticles, Manufacturing

Proceedings Article | 24 May 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Optical alignment, Chemical mechanical planarization, Polishing, Semiconducting wafers, Etching, Scanning probe microscopy, Oxides, Overlay metrology, Signal processing, Avalanche photodetectors

Proceedings Article | 29 April 2004
Proc. SPIE. 5378, Data Analysis and Modeling for Process Control
KEYWORDS: Optical alignment, Overlay metrology, Metals, Semiconducting wafers, Chemical mechanical planarization, Calibration, Process control, Etching, Metrology, Manufacturing

Proceedings Article | 14 September 2001
Proc. SPIE. 4346, Optical Microlithography XIV
KEYWORDS: Image processing, Semiconducting wafers, Image sensors, Reticles, Critical dimension metrology, Calibration, Logic, Reflectivity, Californium, Algorithm development

Showing 5 of 6 publications
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