Dr. Yudhishthir P. Kandel
at Synopsys Inc
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Reticles, Silicon, Reflectivity, Near field, Photomasks, Extreme ultraviolet, Molybdenum, Semiconducting wafers

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Electron beams, Optical lithography, Data modeling, Scattering, Photons, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, High volume manufacturing, Semiconducting wafers

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Mirrors, Contamination, Sulfur, Hydrogen, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers, Ruthenium

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Reticles, X-ray optics, Sensors, Wavefront sensors, Wavefronts, Optical testing, Zernike polynomials, Photomasks, Artificial intelligence, Prototyping

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Reticles, X-ray optics, Sensors, Interferometry, Wavefront sensors, Wavefronts, Optical testing, Zernike polynomials, Photomasks, Condition numbers

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Wafer-level optics, Electron beams, Contamination, Scanners, Molecules, Hydrogen, Photoresist materials, Extreme ultraviolet lithography, Semiconducting wafers, Plasma

Showing 5 of 8 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top