Dr. Yudhishthir P. Kandel
at SYNOPSYS INC
SPIE Involvement:
Author
Publications (11)

PROCEEDINGS ARTICLE | March 28, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Polymers, Photons, Ionizing radiation, Electrons, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Radiation effects, Photoresist developing, Standards development

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Optical lithography, Scattering, Light scattering, Manufacturing, Near field, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Reflectors, Reticles, Silicon, Reflectivity, Photomasks, Extreme ultraviolet, Optical proximity correction, Critical dimension metrology, Molybdenum, Semiconducting wafers

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Reticles, Silicon, Reflectivity, Near field, Photomasks, Extreme ultraviolet, Molybdenum, Semiconducting wafers

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Electron beams, Optical lithography, Data modeling, Scattering, Photons, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, High volume manufacturing, Semiconducting wafers

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Mirrors, Contamination, Sulfur, Hydrogen, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers, Ruthenium

Showing 5 of 11 publications
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