Dr. Yudhishthir P. Kandel
at Synopsys Inc
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 23 March 2020
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Lithography, Data modeling, Calibration, Image processing, Monte Carlo methods, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Failure analysis, Stochastic processes

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Multilayers, Optical lithography, Data modeling, Atomic force microscopy, Photomasks, Extreme ultraviolet, Optical proximity correction, SRAF, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 28 March 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Polymers, Photons, Ionizing radiation, Electrons, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Radiation effects, Photoresist developing, Standards development

Proceedings Article | 19 March 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Optical lithography, Scattering, Light scattering, Manufacturing, Near field, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 19 March 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Reflectors, Reticles, Silicon, Reflectivity, Photomasks, Extreme ultraviolet, Optical proximity correction, Critical dimension metrology, Molybdenum, Semiconducting wafers

Showing 5 of 13 publications
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