Dr. Yue Zhou
Metrology Engineer at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Area of Expertise:
wafer geometry , optical profilimetry , scatterometry , semiconductor overlay , diffraction based overlay , patterning development
Publications (4)

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Defense and security, Diffraction, Metrology, Image processing, Image analysis, Scatterometry, Environmental sensing, Overlay metrology, Chemical mechanical planarization, Diffraction gratings

PROCEEDINGS ARTICLE | March 24, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Photovoltaics, Metrology, Diffractive optical elements, Detection and tracking algorithms, Optical properties, Etching, Scatterometry, Signal processing, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 15, 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Oxides, Thin films, Lithography, Metrology, Optical lithography, Data modeling, Silicon, Distortion, Silicon films, Process control, Error control coding, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | September 13, 2012
Proc. SPIE. 8493, Interferometry XVI: Techniques and Analysis
KEYWORDS: Confocal microscopy, Microscopes, Metrology, Optical spheres, Interferometers, Calibration, Error analysis, Interferometry, Profilometers, Spherical lenses

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