Dr. Yue Zhou
Metrology Engineer at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Area of Expertise:
wafer geometry , optical profilimetry , scatterometry , semiconductor overlay , diffraction based overlay , patterning development
Publications (8)

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Scatterometry, Process control, Overlay metrology

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Optical filters, Metrology, Polarization, Inspection, Scatterometry, Process control, Modeling and simulation, Semiconducting wafers, Overlay metrology

Proceedings Article | 20 March 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Reticles, Metrology, Scanners, Extreme ultraviolet, High volume manufacturing, Optical alignment, Optimization (mathematics), Semiconducting wafers, HVAC controls, Overlay metrology

Proceedings Article | 16 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Lithography, Visualization, Scanners, Manufacturing, Diagnostics, Process control, Semiconducting wafers, Yield improvement, Overlay metrology

Proceedings Article | 28 March 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Defense and security, Diffraction, Metrology, Image processing, Image analysis, Scatterometry, Environmental sensing, Overlay metrology, Chemical mechanical planarization, Diffraction gratings

Showing 5 of 8 publications
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