Yueliang Yao
Field Engineer at ASML
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 17 May 2019
Proc. SPIE. 10961, Optical Microlithography XXXII
KEYWORDS: Metrology, Data modeling, Calibration, Image processing, Scanning electron microscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Performance modeling

Proceedings Article | 20 March 2019
Proc. SPIE. 10961, Optical Microlithography XXXII
KEYWORDS: Lithography, Data modeling, Physics, Feature extraction, Neural networks, Machine learning, Computational lithography, Optical proximity correction, Convolution, Process modeling

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