Yuh-Hwa Li
at Taiwan ROC
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | December 1, 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Mathematical modeling, Thin films, Metrology, Data modeling, Optical properties, Scatterometry, Process control, Integrated optics, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Wafer-level optics, Infrared sensors, Metrology, Sensors, Calibration, Scanners, Error analysis, Integrated optics, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Metrology, Cadmium, 3D applications, Etching, Inspection, Scanning electron microscopy, Scatterometry, 3D metrology, Critical dimension metrology, Semiconducting wafers

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