Yuho Kanaya
at Nikon Corp
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 10 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Reticles, Metrology, Interferometers, Sensors, Computer programming, Servomechanisms, Artificial intelligence, Double patterning technology, Semiconducting wafers, Overlay metrology

Proceedings Article | 24 May 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Wafer-level optics, Monochromatic aberrations, Deep ultraviolet, Scanners, Reflectivity, Wavefront aberrations, Objectives, Optical alignment, Semiconducting wafers, Optics manufacturing

Proceedings Article | 29 April 2004
Proc. SPIE. 5378, Data Analysis and Modeling for Process Control
KEYWORDS: Microscopes, Data modeling, Sensors, Error analysis, Computing systems, Image sensors, Signal processing, Software development, Optical alignment, Semiconducting wafers

Proceedings Article | 26 June 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Lithography, Statistical analysis, Particles, Distortion, Computer simulations, Optical alignment, Neodymium, Semiconducting wafers, Expectation maximization algorithms, Visibility

Proceedings Article | 2 June 2003
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Microscopes, Monochromatic aberrations, Spatial frequencies, Reflectivity, Image analysis, Optical alignment, Neodymium, Semiconducting wafers, Phase shifts, Chemical mechanical planarization

Showing 5 of 7 publications
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