Prof. Yuichi Inazuki
at Dai Nippon Printing Co Ltd
SPIE Involvement:
Publications (24)

Proceedings Article | 28 June 2013 Paper
Tsukasa Abe, Yuichi Inazuki, Yukie Kobayashi, Yasutaka Morikawa, Hiroshi Mohri, Naoya Hayashi
Proceedings Volume 8701, 87010R (2013)
KEYWORDS: Photomasks, Etching, Extreme ultraviolet, Extreme ultraviolet lithography, Dry etching, Optical lithography, Inspection, Photoresist processing, Chromium, Wet etching

Proceedings Article | 7 April 2011 Paper
Proceedings Volume 7969, 79691B (2011)
KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Defect detection, Lithography, Manufacturing, Particles, Electronic components, Opacity

Proceedings Article | 2 April 2011 Paper
Naoya Hayashi, Tsukasa Abe, Takeya Shimomura, Yuichi Inazuki, Tadahiko Takikawa, Hiroshi Mohri
Proceedings Volume 7985, 798505 (2011)
KEYWORDS: Photomasks, Inspection, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Defect inspection, EUV optics, Reflectivity, Optics manufacturing, Mask cleaning

Proceedings Article | 25 September 2010 Paper
Takeya Shimomura, Yuichi Inazuki, Tsukasa Abe, Tadahiko Takikawa, Hiroshi Mohri, Naoya Hayashi, Fei Wang, Long Ma, Yan Zhao, Chiyan Kuan, Hong Xiao, Jack Jau
Proceedings Volume 7823, 78232B (2010)
KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Defect inspection, Bridges, Opacity, Defect detection, Scanning electron microscopy, Optical inspection, Extreme ultraviolet lithography

Proceedings Article | 25 September 2010 Paper
Yuichi Inazuki, Takeya Shimomura, Tsukasa Abe, Taichi Ogase, Satoshi Kawashima, Tadahiko Takigawa, Hiroshi Mohri, Naoya Hayashi
Proceedings Volume 7823, 78231W (2010)
KEYWORDS: Line width roughness, Image segmentation, Photomasks, Optical lithography, Extreme ultraviolet lithography, Scanning electron microscopy, Extreme ultraviolet, Semiconducting wafers, Polymers, Optical properties

Showing 5 of 24 publications
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