Prof. Yuichi Inazuki
at Dai Nippon Printing Co Ltd
SPIE Involvement:
Author
Publications (24)

Proceedings Article | 28 June 2013
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Optical lithography, Etching, Dry etching, Inspection, Chromium, Photomasks, Extreme ultraviolet, Wet etching, Extreme ultraviolet lithography, Photoresist processing

Proceedings Article | 7 April 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Defect detection, Opacity, Particles, Manufacturing, Inspection, Electronic components, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

Proceedings Article | 2 April 2011
Proc. SPIE. 7985, 27th European Mask and Lithography Conference
KEYWORDS: Lithography, Inspection, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optics manufacturing, Mask cleaning, EUV optics, Defect inspection

Proceedings Article | 25 September 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Defect detection, Opacity, Inspection, Scanning electron microscopy, Optical inspection, Bridges, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Defect inspection

Proceedings Article | 25 September 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Carbon, Etching, Image processing, Ions, Scanning electron microscopy, Transmission electron microscopy, Photomasks, Extreme ultraviolet, Cadmium sulfide, Semiconducting wafers

Proceedings Article | 25 September 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Optical lithography, Optical properties, Polymers, Image segmentation, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers

Showing 5 of 24 publications
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