Dr. Yuichi Terashita
at Tokyo Electron Kyushu Ltd
SPIE Involvement:
Author
Publications (6)

SPIE Journal Paper | July 15, 2016
JM3 Vol. 15 Issue 03
KEYWORDS: Line width roughness, Extreme ultraviolet lithography, Electroluminescence, Extreme ultraviolet, Scanning electron microscopy, Chemically amplified resists, Lithography, Photomasks, Line edge roughness, Photoresist processing

PROCEEDINGS ARTICLE | March 25, 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Semiconductors, Lithography, Electron beam lithography, Metals, Ultraviolet radiation, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Picosecond phenomena, Floods

PROCEEDINGS ARTICLE | March 22, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Polymers, Image processing, Ultraviolet radiation, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Picosecond phenomena, Line edge roughness, Floods, Absorption

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Semiconductors, Lithography, Light sources, Manufacturing, Electroluminescence, Scanning electron microscopy, Electronic components, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Line edge roughness, Floods, Industrial chemicals, Chemically amplified resists

PROCEEDINGS ARTICLE | April 4, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Metrology, Scanners, Particles, Manufacturing, Inspection, Bridges, High volume manufacturing, Critical dimension metrology, Semiconducting wafers, Standards development

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Optical lithography, Diffusion, Manufacturing, Photoresist materials, Photomasks, Semiconductor manufacturing, Critical dimension metrology, Semiconducting wafers, Photoresist developing, Temperature metrology

Showing 5 of 6 publications
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