Dr. Yuichi Yoshida
at Tokyo Electron Kyushu Ltd
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 8 April 2019
Proc. SPIE. 10960, Advances in Patterning Materials and Processes XXXVI
KEYWORDS: Switching, Calibration, 3D modeling, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Stochastic processes

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Data modeling, Calibration, Ultraviolet radiation, Scanning electron microscopy, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Modeling and simulation, Stochastic processes

Proceedings Article | 20 March 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Optical lithography, Polymers, Capillaries, Particles, NOx, Bridges, Photoresist processing, Semiconducting wafers, Yield improvement, Wafer manufacturing

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Water, Coating, Surface properties, Line width roughness, Immersion lithography, Thin film coatings, Photoresist processing, Semiconducting wafers, Defect inspection

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Polymers, Image processing, Materials processing, Dynamic light scattering, Photoresist materials, Photomasks, Photoresist processing, Semiconducting wafers, Photoresist developing

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Electron beams, Etching, Quartz, Manufacturing, Inspection, Photomasks, Nanoimprint lithography, Photoresist processing, Semiconducting wafers, Vestigial sideband modulation

Showing 5 of 11 publications
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