Yuichiro Inatomi
at Tokyo Electron AT Ltd
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 15 April 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Etching, Image processing, Photomasks, Line width roughness, Immersion lithography, Vacuum ultraviolet, Photoresist processing, Semiconducting wafers, Natural surfaces

Proceedings Article | 11 April 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Semiconductors, Lithography, Light sources, Etching, Photomasks, Line width roughness, Vacuum ultraviolet, Photoresist processing, Semiconducting wafers, Natural surfaces

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