Dr. Yuichiro Yamazaki
CTO at TASMIT Inc
SPIE Involvement:
Author
Publications (48)

Proceedings Article | 2 April 2020 Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Electron beam lithography, Metrology, Logic, Metals, Scanning electron microscopy, Extreme ultraviolet lithography, Optical proximity correction, Semiconducting wafers, OLE for process control, Back end of line

Proceedings Article | 20 March 2020 Presentation + Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Metrology, Data modeling, Calibration, Image processing, 3D modeling, Scanning electron microscopy, Image quality, Photomasks, Optical proximity correction, Semiconducting wafers

Proceedings Article | 20 March 2020 Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Edge detection, Scanning electron microscopy, Precision measurement, Machine learning, Computer aided design

Proceedings Article | 11 April 2019 Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Databases, Scanners, Distortion, Scanning electron microscopy, Photoresist materials, Line edge roughness, Overlay metrology

Proceedings Article | 26 March 2019 Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Logic, Metals, Inspection, Distortion, Scanning electron microscopy, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

Showing 5 of 48 publications
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