Dr. Yuichiro Yamazaki
CTO at NGR Inc
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 11 April 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Databases, Scanners, Distortion, Scanning electron microscopy, Photoresist materials, Line edge roughness, Overlay metrology

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Logic, Metals, Inspection, Distortion, Scanning electron microscopy, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 28 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Signal to noise ratio, Imaging systems, Interference (communication), Scanning electron microscopy, Image quality, Optical resolution, Image display, Semiconducting wafers

Proceedings Article | 13 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Semiconductors, Edge detection, Metrology, Databases, Image processing, Inspection, Scanning electron microscopy, Photoresist materials, Image quality, Critical dimension metrology

Proceedings Article | 8 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Statistical analysis, Databases, Manufacturing, Resistance, Inspection, Image quality, Process control, Raw materials, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Electrical breakdown

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