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Yuji Koyanagi
at KLA-Tencor Japan
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Publications (1)
Proceedings Article | 10 March 2010 Paper
Simultaneous optimization of dose and focus controls in advanced ArF immersion scanners
Tsuyoshi Toki, Pavel Izikson, Junichi Kosugi, Naruo Sakasai, Keiko Saotome, Kazuaki Suzuki, Daniel Kandel, John Robinson, Yuji Koyanagi
Proceedings Volume 7640, 764016 (2010) https://doi.org/10.1117/12.846413
KEYWORDS: Semiconducting wafers, Control systems, Finite element methods, Critical dimension metrology, Error analysis, Scanners, Neural networks, Scatter measurement, Scatterometry, Data modeling
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