Mr. Yuji Setta Profile

Yuji Setta

at e-Shuttle Inc

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Publications (3)

Proceedings Article | 4 March 2010 Paper

Study for lithography techniques of hybrid mask shape of contact hole with 1.35NA polarized illumination for 28nm-node and below logic LSI

Yuji Setta, Katsuyoshi Kobayashi, Tatsuo Chijimatsu, Satoru Asai

Proceedings Volume 7640, 76402I (2010) https://doi.org/10.1117/12.848316

KEYWORDS: Photomasks, Lithographic illumination, Lithography, Polarization, Critical dimension metrology, Logic, Source mask optimization, Image segmentation, Resolution enhancement technologies, Optical lithography

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Proceedings Article | 7 March 2008 Paper

Study of ELS technology for random logic LSI toward 32-nm node

Yuji Setta, Kazumasa Morishita, Katsuyoshi Kobayashi, Tatsuo Chijimatsu, Satoru Asai

Proceedings Volume 6924, 692423 (2008) https://doi.org/10.1117/12.772490

KEYWORDS: Electrophoretic light scattering, Logic, Lithography, Optical lithography, Double patterning technology, Electronic design automation, Standards development, Etching, Semiconducting wafers, Semiconductors

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Proceedings Article | 20 March 2006 Paper

Optimization of contact hole lithography for 65-nm node logic LSI

Yuji Setta, Hiroki Futatsuya, Atsushi Sagisaka, Tatsuo Chijimatsu, Takayoshi Minami, Fumitoshi Sugimoto, Seiichi Ishikawa, Satoru Asai

Proceedings Volume 6154, 61543T (2006) https://doi.org/10.1117/12.656224

KEYWORDS: SRAF, Lithographic illumination, Lithography, Fiber optic illuminators, Logic, Optical lithography, Photomasks, Semiconducting wafers, Industrial chemicals, Resolution enhancement technologies

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