Mr. Yuji Setta
at e-Shuttle Inc
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | March 4, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Logic, Optical lithography, Lithographic illumination, Polarization, Image segmentation, Photomasks, Source mask optimization, Critical dimension metrology, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 7, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Semiconductors, Lithography, Logic, Optical lithography, Etching, Double patterning technology, Semiconducting wafers, Electronic design automation, Electrophoretic light scattering, Standards development

PROCEEDINGS ARTICLE | March 20, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Logic, Optical lithography, Lithographic illumination, Photomasks, SRAF, Semiconducting wafers, Industrial chemicals, Resolution enhancement technologies, Fiber optic illuminators

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