We succeeded in development of SOG materials comprised of cage-type phenyl silsesquioxanes (PSQ) and their
alkali soluble derivatives. The alkali soluble silsesquioxane (APSQ) can provide both positive and negative tone
photosensitive SOG combination with diazo naphtoquinone (DNQ) and photo-base (acid) agent, respectively.
Here we present feature of photolithography process and film properties for our SOG materials.