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Yuki Yamana
at Osaka Institute of Technology
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Publications (1)
Proceedings Article | 4 December 2012 Paper
Laser removal of positive-tone diazonaphthoquinone / novolak resist without occurring laser-induced damage to the silicon wafer
Yuki Yamana, Yoshiaki Matsura, Hiroki Muraoka, Hideo Horibe, Tomosumi Kamimura
Proceedings Volume 8530, 85301V (2012) https://doi.org/10.1117/12.977338
KEYWORDS: Silicon, Semiconducting wafers, Laser irradiation, Laser damage threshold, Laser induced damage, Near infrared, Visible radiation, Laser energy, Semiconductor lasers, Nd:YAG lasers
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