Prof. Yukihiro Fujimura
Photo-Mask Engineer at Dai Nippon Printing Co Ltd
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | May 10, 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Metals, Silicon, Transmittance, Photomasks, Excimer lasers, Double patterning technology, Optical proximity correction, Semiconducting wafers, Phase shifts

PROCEEDINGS ARTICLE | July 9, 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Lithography, Opacity, Image processing, Inspection, Electroluminescence, Transmittance, Photomasks, Excimer lasers, Semiconducting wafers, Phase shifts

PROCEEDINGS ARTICLE | November 1, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Diffractive optical elements, Etching, Chromium, Process control, Photomasks, Line width roughness, Cadmium sulfide, SRAF, Mask making, Photoresist processing

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Optical lithography, Etching, Diffusion, Chromium, Scanning electron microscopy, Photomasks, SRAF, Photoresist processing, Standards development, Chemically amplified resists

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Etching, Dry etching, Ultraviolet radiation, Coating, Resistance, Chromium, Scanning electron microscopy, Photomasks, Fluorine, Photoresist processing

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