Prof. Yukihiro Fujimura
Photo-Mask Engineer at Dai Nippon Printing Co Ltd
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 10 May 2016 Paper
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Photomasks, Double patterning technology, Semiconducting wafers, Metals, Phase shifts, Optical proximity correction, Silicon, Excimer lasers, Transmittance

Proceedings Article | 9 July 2015 Paper
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Inspection, Transmittance, Excimer lasers, Electroluminescence, Phase shifts, Image processing, Opacity

Proceedings Article | 1 November 2007 Paper
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Etching, Line width roughness, Photomasks, Chromium, Cadmium sulfide, Process control, SRAF, Photoresist processing, Diffractive optical elements, Mask making

Proceedings Article | 20 October 2006 Paper
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Etching, Chromium, Photoresist processing, SRAF, Diffusion, Scanning electron microscopy, Standards development, Chemically amplified resists, Photomasks, Optical lithography

Proceedings Article | 20 October 2006 Paper
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Etching, Dry etching, Resistance, Photoresist processing, Coating, Photomasks, Chromium, Fluorine, Ultraviolet radiation, Scanning electron microscopy

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