Prof. Yukihiro Fujimura Profile

Prof. Yukihiro Fujimura

Photo-Mask Engineer at Dai Nippon Printing Co Ltd

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Publications (5)

Proceedings Article | 10 May 2016 Paper

Lithographic performance of a new “low-k” mask

Takashi Adachi, Ayako Tani, Yukihiro Fujimura, Katsuya Hayano, Yasutaka Morikawa, Hiroyuki Miyashita, Yukio Inazuki, Yoshio Kawai

Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology

KEYWORDS: Lithography, Photomasks, Double patterning technology, Semiconducting wafers, Metals, Phase shifts, Optical proximity correction, Silicon, Excimer lasers, Transmittance

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Proceedings Article | 9 July 2015 Paper

Development of new high transmission eaPSM for Negative Tone Development process on wafer

Takashi Adachi, Ayako Tani, Yukihiro Fujimura, Shingo Yoshikawa, Katsuya Hayano, Yasutaka Morikawa, Yoichi Miura, Hiroyuki Miyashita

Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII

KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Inspection, Transmittance, Excimer lasers, Electroluminescence, Phase shifts, Image processing, Opacity

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Proceedings Article | 1 November 2007 Paper

Practical use of hard mask process to fabricate fine photomasks for 45nm node and beyond

Yasuyuki Kushida, Hitoshi Handa, Hiroshi Maruyama, Yuuki Abe, Yukihiro Fujimura, Toshifumi Yokoyama

Proc. SPIE. 6730, Photomask Technology 2007

KEYWORDS: Etching, Line width roughness, Photomasks, Chromium, Cadmium sulfide, Process control, SRAF, Photoresist processing, Diffractive optical elements, Mask making

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Proceedings Article | 20 October 2006 Paper

Multi-layer resist system for 45-nm-node and beyond: part I

M. Hashimoto, H. Shiratori, K. Horii, Y. Yokoya, Y. Ohkubo, H. Takamizawa, Y. Fujimura, J. Morimoto, A. Manoshiro, M. Shimizu, T. Yokoyama, T. Enomoto, M. Nagai

Proc. SPIE. 6349, Photomask Technology 2006

KEYWORDS: Etching, Chromium, Photoresist processing, SRAF, Diffusion, Scanning electron microscopy, Standards development, Chemically amplified resists, Photomasks, Optical lithography

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Proceedings Article | 20 October 2006 Paper

Multi-layer resist system for 45-nm-node and beyond: Part II

Yukihiro Fujimura, Jumpei Morimoto, Asuka Manoshiro, Mochihiro Shimizu, Hideyoshi Takamizawa, Masahiro Hashimoto, Hiroshi Shiratori, Katsuhiko Horii, Yasunori Yokoya, Yasushi Ohkubo, Tomoyuki Enomoto, Takahiro Sakaguchi, Masaki Nagai

Proc. SPIE. 6349, Photomask Technology 2006

KEYWORDS: Etching, Dry etching, Resistance, Photoresist processing, Coating, Photomasks, Chromium, Fluorine, Ultraviolet radiation, Scanning electron microscopy

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