Yukihiro Masuda
Director Special Project at D2S Inc
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | July 13, 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Point spread functions, Manufacturing, Photomasks, Extreme ultraviolet, SRAF, Nanoimprint lithography, Line edge roughness, Semiconducting wafers, Vestigial sideband modulation

PROCEEDINGS ARTICLE | July 13, 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Metrology, Backscatter, Time metrology, Thermal effects, Mathematics, Photomasks, Beam shaping, Thermal modeling, Vestigial sideband modulation, Temperature metrology

SPIE Journal Paper | March 23, 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Critical dimension metrology, Beam shaping, Vestigial sideband modulation, Photomasks, Diffusion, Glasses, Line edge roughness, Error analysis, Thermal modeling, Temperature metrology

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top