Dr. Yukiko Kikuchi
Researcher at Toshiba Materials Co Ltd
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 8 April 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Etching, Dry etching, Ions, Photomasks, Extreme ultraviolet, Line width roughness, Ion implantation, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers

Proceedings Article | 23 March 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Lithography, Surface plasmons, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Critical dimension metrology, Line edge roughness, Photoresist processing, Semiconducting wafers

Proceedings Article | 23 March 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Lithography, Silica, Etching, Metals, Manufacturing, Extreme ultraviolet, Extreme ultraviolet lithography, Reactive ion etching, Photoresist processing, Semiconducting wafers

Proceedings Article | 12 April 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Modulation, Polymers, Additive manufacturing, Printing, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers

Proceedings Article | 16 March 2007
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Lithography, Optical lithography, Diffusion, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers, EUV optics

Proceedings Article | 24 March 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Lithography, Optical lithography, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Immersion lithography, Nanoimprint lithography, Semiconducting wafers, Resolution enhancement technologies

Showing 5 of 14 publications
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